Atomic Layer Deposition Tool

Beskrivning

Lund Nano Lab (LNL) at Lund University, Sweden is acquiring an atomic layer deposition equipment for deposition of a wide variety of thin film materials from the vapor phase of matter. The system is intended to be dedicated for depositions on III/IV materials and in the first place must be prepared for deposition of high-quality thin layers of AlOx, HfOx, and other dielectric materials. The instrument will be placed at Lund Nano Lab, Lund University.