Next generation physical vapour deposition (PVD) system

Beskrivning

KTH is seeking tenders for a tool for thick-film deposition. The main application of the tool will be metallization of micro- and nanoelectronic circuits, deposition of thick hard masks for deep reactive ion etching of refractory materials, and deposition on irregular shaped and very thick substrates. The samples will mainly be large batches of individual chips and some 100 mm diameter wafers and irregular substrates.