Plasma Systems for Etching

Beskrivning

RISE is procuring one or two agreements (each the “Agreement”) for the delivery and commissioning of two separate pieces of equipment that will be placed in a cleanroom and used for research and development as well as small-scale manufacturing of semiconductor components: 1. One inductively coupled plasma system for etching III-V materials; and 2. One plasma system for RIE etching of dielectrics like SiO and SiN.